Magnetic devices and method of manufacture
US4360893A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 1980 |
| Grant date | Nov 23, 1982 |
| Priority date | — |
| Expiry date | Jun 26, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/14
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Magnetic devices exemplified by bubble devices depend upon functional magnetic layers initially produced by epitaxy and reduced to effectively thinned surface layers by ion implantation. Implantation is at well-defined energy spectral levels which minimize effect on surface layers and which predominantly affect a "buried layer". As a result, such affected layer acts as a boundary layer of a functional layer which is spaced away from an interface between a substrate and a deposited layer. Commercial significance is primarily concerned with high bit density devices in which effectively thinned regions are less than 3 micrometers in thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.