Apparatus for monitoring and/or controlling plasma processes
US4362936A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 26, 1980 |
| Grant date | Dec 7, 1982 |
| Priority date | — |
| Expiry date | Nov 26, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus for monitoring a plasma process in which a plasma is formed to occupy a specified region, which apparatus is composed of: a mass spectrometer system including a mass analyzer having an ion inlet and an ion outlet and an ion detector disposed in operative association with the ion outlet; an output device connected to the detector for providing an output signal representative of the mass spectrum of ions observed by the mass spectrometer system; and an ion-optical system having an inlet opening located in the vicinity of the specified region and disposed for extracting ions from the plasma and focussing the ions thus extracted onto the ion inlet of the analyzer, whereby the output signal produced by the output device is representative of the mass spectrum of ions in the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.