Positive-working resist quinone diazide containing composition and imaging method having improved development rates
US4365019A · kind A · utility
12Cited by
22References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1981 |
| Grant date | Dec 21, 1982 |
| Priority date | — |
| Expiry date | Aug 6, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.