Floor polishing machine
US4365377A · kind A · utility
20Cited by
3References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1981 |
| Grant date | Dec 28, 1982 |
| Priority date | — |
| Expiry date | Jan 13, 2001 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA47L11/4075
- WIPO fieldFurniture, games
- WIPO sectorOther fields
Abstract
An apparatus for polishing a floor includes a rotated polishing pad suspended from a housing with a mechanism for maintaining full engagement of the surface of the pad with the floor. This mechanism includes a caster disposed within a centrally-located aperture in the pad and a device, such as a spring, connecting the caster to the housing which increasingly urges the caster and housing away from one another as they progressively approach one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.