Image formation process
US4368253A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 1982 |
| Grant date | Jan 11, 1983 |
| Priority date | — |
| Expiry date | Jan 19, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/124
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming an image by a positive resist process comprises: PA0 (1) exposing imagewise to actinic radiation a photoresist composition comprising: PA0 (a) a film-forming organic material having at least one substituted benzoin group of formula: ##STR1## where R.sup.1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl, or aralkyl group or a group --(CH.sub.2).sub.b X; R.sup.2 denotes a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group; R.sup.3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group; X denotes a halogen atom, an alkoxy group, a phenoxy group, a group --COOR.sup.4 or a group --OOCR.sup.4, where R.sup.4 denotes an alkyl group; a denotes zero or 1; b denotes an integer of from 1 to 4; m and n each denote zero or 1, the sum of m+n being 1; p and q each denote zero or 1, the sum of p+q being 1; and c and d each denote zero or an integer of from 1 to 3; and PA0 (b) a compound which is polymerizable under the influence of a free radical catalyst to form a higher molecular weight material which is more soluble in a developer than the composition prior to exposure, so that the solubility of the c…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.