Patent · US Expired

Method for manufacturing semiconductor elements from amorphous silicon

US4369205A · kind A · utility

16Cited by
3References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 10, 1980
Grant dateJan 18, 1983
Priority date
Expiry dateOct 10, 2000

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S204/05
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method and device for manufacturing semiconductor elements of amorphous licon which convert light into electrical energy comprising, supplying a silicon compound to a vessel, passing an electric field through the vessel sufficient to produce a glow discharge having free electrons in the vessel to precipitate amorphous silicon from the silicon compound onto a substrate in the vessel, and providing a magnetic field in the vessel which is directed substantially transversely to the electric field and is of a magnitude sufficient to conduct the free electrons along closed paths over the surface of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.