Copper formazan compounds, processes for their preparation and their use as dyestuffs

US4370145A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Gunther Schwaiger · Frankfurt, DE
• Ernst Hoyer · Frankfurt am Main, DE

Key dates

• Filing date: Nov 25, 1981
• Grant date: Jan 25, 1983
• Expiry date: Nov 25, 2001

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C09B62/5036
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

New copper-complex formazan compounds of the general formula: ##STR1## in which A is a phenylene or naphthylene radical which can be substituted by halogen, nitro, lower alkyl, lower alkoxy, lower alkylsulfonyl, phenylsulfonyl and optionally alkylated sulfonamide groups and can also be substituted by the radical Z, defined below, B is a straight-chain or branched-chain alkyl group or alkenyl group, which can be substituted by an optionally substituted phenyl radical, or is a phenyl or naphthyl radical, which can be substituted by halogen, lower alkyl, lower alkoxy and lower carbalkoxy, or is the radical or a furan, thiophene, pyrrole, imidazole, indole, pyrazole, pyridine, pyrimidine, quinoline or benzimidazole, it being possible for B likewise to be substituted by the group Z, defined below, Z denotes a group which confers solubility in water, such as the carboxyl group or sulfo group, one to three of which are bonded to A and/or B, Cu is a copper atom, X denotes an oxygen atom or a carbonyloxy group and is bonded to A in the ortho-position relative to the nitrogen atom, Y represents the vinyl or .beta.-thiosulfatoethyl group and M denotes a hydrogen atom or the equivalent of a me…