Heat-developable photosensitive material with antihalation layer
US4376162A · kind A · utility
11Cited by
4References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 19, 1981 |
| Grant date | Mar 8, 1983 |
| Priority date | — |
| Expiry date | Oct 19, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/498
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat-developable photosensitive material is disclosed having a high image sharpness. The material is comprised of a heat-developable photosensitive layer which includes an organic silver salt, a photocatalyst, and a reducing agent. An antihalation layer is provided on the opposite face of the material with respect to the side intended for imagewise exposure. The antihalation layer contains a photosensitive halogen-containing compound which reduces the pH of the antihalation layer by photolysis and is colored with a dye which causes a change of color when the pH of the antihalation layer is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.