Patent · US Expired

Process for producing vacuum deposition films

US4377607A · kind A · utility

4Cited by
7References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 1, 1981
Grant dateMar 22, 1983
Priority date
Expiry dateMay 1, 2001

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C14/14
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In a process for producing vacuum deposition films which comprises providing a vacuum deposition film composed of an alloy or an intermetallic compound of two or more components having different vapor pressures at a specified temperature on a base, the improvement which comprises charging the component having the lower vapor pressure at said temperature to an evaporation source in a vacuum evaporation chamber in such an amount that the evaporation amount thereof per unit time does not substantially vary, and carrying out vacuum evaporation while continuously feeding a component having a higher vapor pressure at said temperature into said evaporation source in an amount corresponding to the evaporation amount thereof per unit time.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.