Process for cleaning copper-containing metal surfaces

US4379834A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Walter Herwig · Bad Soden, DE
• Kurt Klupfel
• Helga Sikora · Wiesbaden, DE
• Heide Sprengel · Wiesbaden, DE

Key dates

• Filing date: Jun 23, 1982
• Grant date: Apr 12, 1983
• Expiry date: Jun 23, 2002

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25D5/34
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process and an aqueous treatment solution for cleaning copper surfaces, in particular for removing residues of photoresist layers, which residues still adhere after development to the cleared copper areas, are described. The solution contains a water-soluble aliphatic sulfonic acid having 8 to 30 carbon atoms or a water-soluble salt thereof.