XUV Laser and method
US4380072A · kind A · utility
6Cited by
0References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 22, 1980 |
| Grant date | Apr 12, 1983 |
| Priority date | — |
| Expiry date | Dec 22, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S4/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The method of generating XUV radiation which involves exciting atoms to a storage level, irradiating the excited atoms and raising them to a higher level and allowing the atoms to lase to a lower level other than ground which is simultaneously emptied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.