Vacuum evaporation system for deposition of thin films
US4380211A · kind A · utility
10Cited by
5References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 3, 1981 |
| Grant date | Apr 19, 1983 |
| Priority date | — |
| Expiry date | Sep 3, 2001 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A blower and a dust collector are communicated through valves with an evacuated process chamber in which are disposed one or more sets of a film-substrate holder and an evaporation source in such a way that the blower, the dust collector and the process chamber constitute a closed circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.