Patent · US Expired

Novel silicon crystals and process for their preparation

US4382838A · kind A · utility

18Cited by
10References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 26, 1976
Grant dateMay 10, 1983
Priority date
Expiry dateJan 26, 1996

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F99/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A plate-like silicon crystal having a columnar structure formed along the direction of the shortest axis, produced by cooling molten silicon, which may contain a doping agent, in a temperature gradient between the two largest boundary surfaces of the melt, one of which has a maximum temperature of 1200.degree. C., and the opposite surface being at least 200.degree. to 1000.degree. C. higher, but below the melting point of silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.