Method for repairing glass photomasks
US4383016A · kind A · utility
11Cited by
11References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 25, 1981 |
| Grant date | May 10, 1983 |
| Priority date | — |
| Expiry date | Sep 25, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/225
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for repairing defects in the form of discontinuities in a photomask pattern in or on a glass substrate by means of electroless deposition of a nickel-containing coating on the surface of a glass substrate is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.