Patent · US Expired

Method of producing solid-state color imaging devices

US4387987A · kind A · utility

3Cited by
5References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 22, 1981
Grant dateJun 14, 1983
Priority date
Expiry dateMay 22, 2001

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F39/8053

Abstract

In a solid-state imaging device wherein filters of the three primary colors in the mosaic filter configuration are stacked on a solid-state imager LSI in which a plurality of picture elements each consisting of a photoelectric conversion element and a scanning element are arrayed in the shape of a matrix; a method of producing a solid-state imaging device wherein the dimensions of filter layout patterns on exposure masks for the respective colors used in case of manufacturing the color filters of: EQU T.sub.R <T.sub.B <T.sub.G where T.sub.R denotes the thickness of the red filter, T.sub.G that of the green filter and T.sub.B that of the blue filter, are smaller than the dimensions of the picture elements, and especially, the dimensions of the filter layout patterns on the exposure mask for manufacturing the green filters are the smallest.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.