Optical system
US4389115A · kind A · utility
44Cited by
7References
14Claims
0Family size
Inventor
Key dates
| Filing date | Aug 6, 1981 |
| Grant date | Jun 21, 1983 |
| Priority date | — |
| Expiry date | Aug 6, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Optical system provides a uniform, well-collimated beam particularly for the exposure of photoresist on integrated circuit boards. The well-collimated beam is produced in a short beam path through the use of a series of mirrors, including concave mirrors and an integrator mirror to produce reliable exposure characteristics at the exposure focal plane. Preferably, a beam splitter is provided so that the focal plane is illuminated on both sides for concurrent exposure of both sides of the board.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.