Process for treating spent silicon-containing reaction masses to produce halosilanes
US4390510A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 1982 |
| Grant date | Jun 28, 1983 |
| Priority date | — |
| Expiry date | Feb 16, 2002 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/1071
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Improved yields of monohydrogentrihalosilanes are achieved by contacting the residual silicon obtained from the preparation of organohalosilanes by a metal-catalyzed direct process by contacting the residual silicon simultaneously with gaseous hydrogen halide and with gaseous alkyl halide to form a residual silicon contact mass; selecting a temperature between about 200.degree. C. and about 350.degree. C. at which alkylation of the silicon contact mass in inhibited and at which hydrohalogenation of the silicon contact mass occurs; and heating the silicon contact mass at the selected temperature. The silicon reacts with the gaseous alkyl halide and the gaseous hydrogen halide at the selected temperature to produce improved yields of the monohydrogentrihalosilane. In preferred embodiments, monohydrogentrichlorosilane is produced by reacting residual silicon with hydrogen chloride and methyl chloride at a temperature less than the temperature at which a predominantly alkylation reaction occurs with the residual contact mass so that there is sufficient hydrohalogenation to form the monohydrogentrichlorosilane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.