Metal oxide patterns with planar surface
US4391849A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 12, 1982 |
| Grant date | Jul 5, 1983 |
| Priority date | — |
| Expiry date | Apr 12, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3163
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The subject invention relates to the fabrication of metal oxide patterns on a substrate adapted for use with thin film magnetic heads. The metal oxide pattern has a precisely defined geometry including nearly vertical side walls, for minimizing read/write errors. In addition, a filler material formed from a non-magnetic, non-metallic compound is provided on the substrate in a pattern complimentary to the metal oxide pattern. In accordance with the subject invention, the top surface of the metal oxide pattern and the filler material are co-planar. By this arrangement, subsequent layers may be uniformly deposited without discontinuities. The subject method includes a plurality of distinct masking and etching steps in order to achieve the desired result.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.