Fine-patterned thick film conductor structure and manufacturing method thereof
US4392013A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1980 |
| Grant date | Jul 5, 1983 |
| Priority date | — |
| Expiry date | Dec 22, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/0723
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In manufacturing a fine-patterned thick film conductor structure, a thin film conductor layer having a film thickness of 0.1-10 .mu.m is formed on an insulating substrate and conductive material is then electroplated on the thin film conductor layer to the thickness of 34.9-190 .mu.m under the condition of a cathode current density of no less than 5 A/dm.sup.2. In patterning the conductors, a film thickness-to-conductor interspacing ratio is selected to be no less than 1.4 to prevent widthwise thickening of the conductors in the electroplating process. Resulting conductor structure has a circuit density of no less than 5 lines/mm and a film thickness of 35-200 .mu.m. It is useful for a high density printed circuit board and a miniature coil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.