Pattern inspection system
US4392120A · kind A · utility
19Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1980 |
| Grant date | Jul 5, 1983 |
| Priority date | — |
| Expiry date | Jun 23, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30108
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A pattern inspection system, for inspecting a pattern formed on a base, such as a photo-mask, by means of laser beam scanning, which includes a device for detecting the body and edges of the pattern a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern and a device for eliminating pinholes and stains within a pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.