Photopolymerizable resins
US4392930A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1982 |
| Grant date | Jul 12, 1983 |
| Priority date | — |
| Expiry date | Jun 30, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/027
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Diacrylates or dimethacrylates, which are compatible with water before exposure to actinic radiation but after such exposure form hard, insoluble, coatings which are resistant to organic solvents and to water, are made by reaction with (meth)acrylic acid, or with a dicarboxylic acid and a hydroxy group-containing (meth)acrylate, of epoxide groups in an advanced diepoxide resin containing groups of formula ##STR1## where R.sup.4 denotes a divalent (cyclo)aliphatic or araliphatic radical, PA0 each R.sup.15 denotes an alkyl group or each pair of R.sup.15 denotes a group of formula --CH.sub.2).sub.2 --, --C(R.sup.16 R.sup.17)CO--, --CH.sub.2 CH(CH.sub.3)--, --CH.sub.2 --.sub.3, or --CO--.sub.2, wherein R.sup.16 and R.sup.17 each represent a hydrogen atom, an alkyl group, or, conjointly, a cycloaliphatic ring, and PA0 c is zero or 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.