Method of vacuum depositing a layer on a plastic film substrate
US4393091A · kind A · utility
5Cited by
4References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1981 |
| Grant date | Jul 12, 1983 |
| Priority date | — |
| Expiry date | Jun 10, 2001 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of vacuum depositing a layer on a plastic film in which the film is transported so as to pass along a metal surface moving with the film, which surface removes heat from the film, and vacuum depositing the vapor of an evaporant onto the surface of the plastic film while it is in contact with the metal surface. The film is in an electret state when it is located at the metal surface, whereby an electrostatic attractive force is produced between the film and the metal surface, thereby increasing the efficiency of heat conduction between the film and the metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.