Stripping compositions and methods of stripping resists
US4395479A · kind A · utility
30Cited by
5References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 1982 |
| Grant date | Jul 26, 1983 |
| Priority date | — |
| Expiry date | Aug 17, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a tetrahydrothiophene 1,1-dioxide compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.