Device for epitaxial depositing layers from a liquid phase

US4406245A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventor

• Jochen Heinen · Haar, DE

Key dates

• Filing date: Sep 2, 1981
• Grant date: Sep 27, 1983
• Expiry date: Sep 2, 2001

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B19/063
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A device for simultaneously producing a plurality of substrate disks each having a plurality of different layers by a liquid phase epitaxy as each substrate disk is moved sequentially through different melts contained in the liquid phase characterized by a first unit having tongues slidably received therein and a plurality of chambers spaced along the direction of sliding of said tongues, a second unit having a crucible for each of said chambers being disposed for relatively movement on the first unit from a position with the crucible out of communication with the chamber to a position in communication for transferring the melt from the crucible to the chamber and each of the said tongues having aligned recesses for receiving the substrate disk so that a row of substrate disks can be passed from one chamber to the next following chamber so that the disks in each row receive epitaxial layers sequentially.