Wet processing of electrodes of a CRT to suppress afterglow
US4406639A · kind A · utility
3Cited by
5References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 29, 1981 |
| Grant date | Sep 27, 1983 |
| Priority date | — |
| Expiry date | Sep 29, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/02
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In the novel method, before an electron-gun mount assembly is sealed into the neck of a CRT, at least the high-voltage electrodes and the adjacent portions of the focus electrodes are dipped into an aqueous solution consisting essentially of hydrogen peroxide and water. The solution contains substantially more than 10, and preferably about 30 to 50, weight percent of hydrogen peroxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.