Process for producing high-purity silica glass
US4406680A · kind A · utility
9Cited by
6References
3Claims
0Family size
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Key dates
| Filing date | Feb 1, 1982 |
| Grant date | Sep 27, 1983 |
| Priority date | — |
| Expiry date | Feb 1, 2002 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2207/36
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for producing high-purity silica glass wherein glass-forming chlorides, hydrogen gas, oxygen and an inert gas are supplied from a glass burner, the chlorides are decomposed by flame oxidation to form fine grains of glass which are deposited on a starting member and the glass deposit is sintered to provide a transparent vitreous substance, the volume ratio of oxygen gas to the sum of the chlorides and hydrogen gas being greater than about 0.6, preferably greater than about 1.0, and less than about 20.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.