Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
US4410621A · kind A · utility
20Cited by
2References
4Claims
0Family size
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Key dates
| Filing date | Apr 3, 1981 |
| Grant date | Oct 18, 1983 |
| Priority date | — |
| Expiry date | Apr 3, 2001 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerization being initiated by a free radical and chain-propagating, (2) a 2-polycyclic aryl-4,5-diphenylimidazolyl dimer wherein the polycyclic aryl group at the 2-position comprises at least two benzene rings condensed each other and (3) a heterocyclic mercaptan compound, said photosensitive resin composition being excellent in having a high photopolymerization initiation potency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.