E-Beam maintained plasma discharge elecrodes
US4414670A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 29, 1981 |
| Grant date | Nov 8, 1983 |
| Priority date | — |
| Expiry date | Sep 29, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/09707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A flowing gas laser utilizes a multilayer gas flow technique wherein laser gas is caused to flow in three distinct layers: an anode gas flow layer flowing adjacent the anode electrode of the laser; a cathode gas flow layer flowing adjacent the cathode electrode of the laser; and a lasing gas flow layer flowing between the anode and cathode layers and through the lasing region of the laser. A higher electron density is produced in the anode and cathode layers than in the middle lasing layer for fostering a higher electric field in the lasing layer and increased electrical efficiency of the laser. The multilayer gas flow technique is also useful in chemical processing devices for generating ozone or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.