Photomask
US4415262A · kind A · utility
16Cited by
2References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 1982 |
| Grant date | Nov 15, 1983 |
| Priority date | — |
| Expiry date | Jan 18, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A photomask is disclosed which is suitable for use in the one-mask method capable of forming a plurality of patterns with one exposure, and in which an opaque pattern having a predetermined form and a semi-transparent pattern having another predetermined form are formed on a transparent substrate, and the semi-transparent pattern is formed of an opaque film having a large number of fine through holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.