Patent · US Expired

Photopolymerization using copper ions

US4415417A · kind A · utility

4Cited by
12References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 19, 1982
Grant dateNov 15, 1983
Priority date
Expiry dateJul 19, 2002

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F2/50
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Photopolymerization of monomers by visible light using a photoreducible dye, a reducing agent and a controlled level of copper ions allows for high molecular weight polymer formation. The molecular weight is found to be proportional to the copper ion concentration. At 10 to 1,000 ppb copper ion concentration, the molecular weight of the polymer is optimum.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.