Developer solution for the development of exposed negative-working diazonium salt layers

US4416976A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventor

• Loni Schell · Hofheim, DE

Key dates

• Filing date: Mar 31, 1981
• Grant date: Nov 22, 1983
• Expiry date: Mar 31, 2001

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/32
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

This invention relates to a developer solution for the development of exposed light-sensitive reproduction layers comprising a water-insoluble binder and a water-insoluble diazonium salt polycondensation product. As the essential constituents, this developer solution contains glycol ethers, glycol esters and water, in detail--about 30 to 80% of a compound of the formula ##STR1## wherein n=1 to 4 and m=1 to 5; about 3 to 30% of a compound of the formula ##STR2## wherein R.sup.1 and R.sup.2 are acyl groups containing 1 to 4 carbon atoms, or one of the two groups is a hydrogen atom and R.sup.3 is a hydrogen atom or a methyl group; about 0 to 15% of 1,3-dioxolane-2-one or 4-methyl-1,3-dioxolane-2-one; about 0 to 20% of a polyhydric alcohol; about 0 to 10% of an organic or inorganic salt which is soluble in the solvent mixture; and about 5 to 45% of water. The invention relates further to a process for the development of negative-working reproduction layers based on (a) water-insoluble diazonium salt polycondensation products and (b) binders which are insoluble in water and in dilute aqueous alkaline solutions. In the process, the exposed reproduction layer is treated with the above-spe…