Patent · US Expired

Preparation of photosensitive block copolymer elements

US4423135A · kind A · utility

93Cited by
10References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 1982
Grant dateDec 27, 1983
Priority date
Expiry dateAug 16, 2002

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/106
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Photosensitive elements comprising a layer of a solvent-soluble, thermoplastic, elastomeric, block copolymer, a nongaseous ethylenically unsaturated compound, and an addition polymerization initiator activatable by actinic light interposed between a support and cover sheet, a flexible polymeric film, e.g., polyamide, being interposed between the cover sheet and the surface of the layer. The elements are useful in preparing printing plates, particularly flexographic printing plates, and other relief images.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.