Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
US4423138A · kind A · utility
19Cited by
8References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 1982 |
| Grant date | Dec 27, 1983 |
| Priority date | — |
| Expiry date | Jan 21, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There are disclosed resist developers in which additives selected from certain tetraalkylammonium or phosphonium cations, benzyltrialkylammonium or phosphonium cations, and benzyltriphenylammonium or phosphonium cations, are effective in enhancing the developer selectivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.