Sputtering device adaptable for coating heat-sensitive substrates
US4426275A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 1981 |
| Grant date | Jan 17, 1984 |
| Priority date | — |
| Expiry date | Nov 27, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3441
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed herein is means adapted for use in combination with magnetically-enhanced sputtering devices whereby said devices are rendered more useful for sputter-coating substrates susceptible to heat-induced deterioration. Said means comprises a screen-like mesh or grid member disposed intermediate the target of said device and the substrate to be coated, and in such a position that said means is also disposed across the magnetic field formed by said device. Said screen-like mesh or grid member is formed of material which is magnetizable in response to the disposition thereof across said magnetic field. Said screen-like mesh or grid member has the desirable effect of suppressing the expansion of heated plasma whereby said plasma is confined to a region proximate said target and generally away from said substrate. Also disclosed is improved anodic means for collecting fast electrons emitted from said target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.