Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer
US4426437A · kind A · utility
18Cited by
13References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 1981 |
| Grant date | Jan 17, 1984 |
| Priority date | — |
| Expiry date | Jun 29, 2001 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/40
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
An imageable article comprising a photoresist layer on a substantially radiation absorbing layer of metal having a microstructured surface characterized by a plurality of randomly positioned discrete protuberances of varying heights and shapes, which protuberances have a height of not less than 20 nanometers nor more than 1500 nanometers, and the bases of which contact the bases of substantially all adjacent protuberances is disclosed. The imageable article is particularly useful in the field of graphic arts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.