Method for the production of conductor tracks applied to a support
US4426775A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 1981 |
| Grant date | Jan 24, 1984 |
| Priority date | — |
| Expiry date | Jun 29, 2001 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49155
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of producing conductor tracks applied to a support, particularly conductor tracks applied on an electrode support of a liquid-crystal display, in which a mask having cutouts corresponding to the conductor tracks is placed on the support and a conductive layer of electrically conductive material is applied corresponding to the cutouts to the support by, for instance, vapor deposition or sputtering. The cutouts are so interrupted at given points by support webs that the mask is imparted a mechanically stable shape in its plane, and that interruptions in the conductor paths are caused by the support webs. This occurs upon the application of the conductor layer of electrically conductive material, partially forming the conductor tracks on the support with interruptions in the conductor tracks masked by the support webs in a first operation by applying the conductive layer of electrically conductive material through the openings of the mask onto the support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.