Patent · US Expired

Method of and apparatus for double-exposure holographic interferometry

US4428675A · kind A · utility

4Cited by
3References
4Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 17, 1981
Grant dateJan 31, 1984
Priority date
Expiry dateJun 17, 2001

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B9/021
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Double-exposure holographic interferometry is carried out using first and second lasers (11), (12) responsive to respective applied firing signals for producing respective pulsed output beams. An optical system is provided oriented such that the output beams of the lasers produce coinciding scene (20) and reference (21) beams. An initiator circuit (30) generates and applies a firing signal to the first laser (11); and a timer/firing device (31), responsive to the generation of a firing signal by the initiator circuit (30), generates and applies a firing signal to the second laser (12) a predetermined period of time later.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.