Method of and apparatus for double-exposure holographic interferometry
US4428675A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 17, 1981 |
| Grant date | Jan 31, 1984 |
| Priority date | — |
| Expiry date | Jun 17, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/021
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Double-exposure holographic interferometry is carried out using first and second lasers (11), (12) responsive to respective applied firing signals for producing respective pulsed output beams. An optical system is provided oriented such that the output beams of the lasers produce coinciding scene (20) and reference (21) beams. An initiator circuit (30) generates and applies a firing signal to the first laser (11); and a timer/firing device (31), responsive to the generation of a firing signal by the initiator circuit (30), generates and applies a firing signal to the second laser (12) a predetermined period of time later.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.