Developing apparatus for exposed photoresist coated wafers
US4429983A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 1982 |
| Grant date | Feb 7, 1984 |
| Priority date | — |
| Expiry date | Mar 22, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This developer station comprises a developing tank arranged with a centrally located rotatable and vertically translatable shaft carrying a workpiece platform at the upper end thereof. Initially, the platform is located above the tank for ease in loading a workpiece, for example an exposed photoresist coated semiconductor device component. The workpiece is then lowered into developing solution in the tank where it is rotated and oscillated vertically for agitational action during a predetermined time period after which it is raised up out of the solution and delayed at a drying station for another predetermined time period. Thereafter, the workpiece is returned to the initial position for unloading.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.