Patent · US Expired

Photopolymerizable mixtures containing elastomeric block polymers and photocurable elements produced therefrom

US4430417A · kind A · utility

60Cited by

10References

9Claims

0Family size

Assignee

BASF SE

Inventors

Gerhard Heinz · Bad Dürkheim, DE
Peter Richter · Karlstein, DE
Wolfgang Mueller · Wappingers Falls, US

Key dates

Filing date	Sep 17, 1982
Grant date	Feb 7, 1984
Priority date	—
Expiry date	Sep 17, 2002

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/108
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Photopolymerizable mixtures of (a) one or more block copolymers, (b) one or more photopolymerizable, ethylenically unsaturated, low molecular weight compounds and (c) a photopolymerization initiator, with or without (d) other additives, contain as component (a) block copolymers which are composed solely of elastomeric polymer blocks, and contain two or more elastomeric polymer blocks having a glass transition temperature of from -20.degree. C. to +15.degree. C., linked by one or more elastomeric polymer blocks having a glass transition temperature of below -20.degree. C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.