Cleaning device for a plasma etching system
US4430547A · kind A · utility
60Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 1981 |
| Grant date | Feb 7, 1984 |
| Priority date | — |
| Expiry date | Oct 6, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32724
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cleaning apparatus for a plasma etching system for etching a sample which includes a chamber having an inlet and an outlet, a sample table positioned in the chamber and which further includes a first electrode, a counter electrode positioned in the chamber opposite the first electrode and a plurality of heating mechanisms positioned in the inlet and outlet of the chamber, in the counter electrode and in the sample table for desorbing a reaction product adsorbed on surfaces of the inlet and outlet of the chamber, the counter electrode and the sample table prior to plasma etching of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.