Photopolymer cleavage imaging system
US4435496A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1982 |
| Grant date | Mar 6, 1984 |
| Priority date | — |
| Expiry date | Sep 22, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed are novel photosensitive compositions containing a compound consisting essentially of repeating structural units of an alkyl aryl ether, which are end-capped with a substituent functional group containing an ethylenically unsaturated moiety, and a photosensitizing effective amount of a free radical generating compound. Through the selected exposure of films and coatings prepared from the above composition, it is possible to record information in such materials in a manner as to alter the physical and/or chemical properties of such films and coatings. This selective modification can then be simply manifested by contacting the exposed surface of the film or coating, subsequent to such exposure, with an alkaline developing solution. These compositions are useful in the graphic arts and in the manufacture of printed curcuit boards for the electronics industry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.