Controlled site epitaxial sensitization
US4435501A · kind A · utility
65Cited by
22References
111Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 30, 1982 |
| Grant date | Mar 6, 1984 |
| Priority date | — |
| Expiry date | Sep 30, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/0051
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
High aspect ratio tabular grain silver halide emulsions, photographic elements incorporating these emulsions, and processes for the use of the photographic elements are disclosed. In the tabular grain emulsions the silver halide grains having a thickness of less than 0.5 micron (preferably less than 0.3 micron) and a diameter of at least 0.6 micron have a high aspect ratio and account for at least 50 percent of the total projected area of the silver halide grains present. Silver salt is epitaxially located on and substantially confined to selected surface sites of the tabular silver halide grains.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.