Structural defect detection
US4436999A · kind A · utility
8Cited by
7References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 8, 1982 |
| Grant date | Mar 13, 1984 |
| Priority date | — |
| Expiry date | Jun 8, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/91
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and composition for the detection of microdefects in the surface layer of a substrate is disclosed. The composition utilizes dimethylsulfoxide as a primary solvent and a fluorescent organic compound which fluoresces principally in solution. The visibility of microdefects is enhanced by etching the substrate underlying them to form channels for the fluorescent compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.