Plasma treating apparatus
US4438368A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1981 |
| Grant date | Mar 20, 1984 |
| Priority date | — |
| Expiry date | Oct 28, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/302
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma treating apparatus includes: an air-core coil for generating a static magnetic field which is axially uniform and a high-frequency waveguide for generating a high-frequency electromagnetic field which is irregular in the axial direction of the air-core coil. A plasma generating glass tube is disposed in the high-frequency waveguide and adapted to be supplied with a gas and a plasma reaction bath held under a vacuum for receiving the plasma flow which is generated axially in the glass tube. A substrate platform is disposed in the reaction bath for supporting a substrate to be treated at a right angle with respect to the plasma flow. There is also included a magnetic field generating coil disposed outside of said reaction bath for shaping the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.