Optical beam deflection system
US4439016A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 1981 |
| Grant date | Mar 27, 1984 |
| Priority date | — |
| Expiry date | Nov 6, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/2955
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention comprises a system for deflecting an optical beam in response to an electrical signal. A collimated optical beam is generated utilizing any convenient means. The collimated light beam is injected into an optical wave guide positioned between two electrodes. One electrode is substantially coextensive with the surface of the waveguide. The second electrode comprises a series of spaced stripes parallel to the optical beam and having varying length across the surface of the electro-optically sensitive material. The electro-optically sensitive material is subjected to a varying electrical field by applying an electrical voltage to the electrodes causing the velocity of propagation of the light through the electro-optically sensitive material to vary across the layer. This changes the phase relationship of the optical beam across its diameter as it emerges from the edge of the electro-optically sensitive material. This results in a deflection of the electro-optical beam. Beam positioned detection means detects the position of the optical beam as deflected and correlates the beam position with the magnitude of the deflection voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.