Optical double-slit particle measuring system
US4441816A · kind A · utility
20Cited by
11References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 25, 1982 |
| Grant date | Apr 10, 1984 |
| Priority date | — |
| Expiry date | Mar 25, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/0205
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.