Measuring apparatus for the analytical determination of a gas partial pressure
US4444645A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 1982 |
| Grant date | Apr 24, 1984 |
| Priority date | — |
| Expiry date | Jul 12, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/4163
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The measuring apparatus is based on an electrochemical sensor with a hollow chamber connected upstream through which the gas to be measured diffuses to the sensor surface. A pump for introducing a rinsing gas is connected to the hollow chamber. Moreover, the rinsing gas connection is connected to a test gas source which produces a known concentration of the component to be measured. The function of the sensor may be controlled by connecting the test gas source. The accuracy of the measured values and thus the reliability of the measuring apparatus may be substantially improved by these measures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.