Method and apparatus for correcting transparent defects on a photomask
US4444801A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 1982 |
| Grant date | Apr 24, 1984 |
| Priority date | — |
| Expiry date | Jan 12, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/225
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for correcting transparent defects on a photomask are disclosed. A metal-organic complex solution is applied to a transparent defect portion and its periphery on the photomask. The transparent defect portion is then exposed to a visible ray or ultraviolet ray to deposit a metal, a metal oxide or a composition thereof, while the light transmission quantity through the transparent defect portion is measured. After the measurement falls below a predetermined level relative to the quantity of the transmitted light at the start of exposure, the exposure is terminated to thereby complete the correction of the transparent defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.