Photosensitive composition
US4444868A · kind A · utility
10Cited by
2References
4Claims
0Family size
Assignees
Inventor
Key dates
| Filing date | Aug 3, 1982 |
| Grant date | Apr 24, 1984 |
| Priority date | — |
| Expiry date | Aug 3, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition, comprising a photo-insolubilizable resin having a styryl type nitrogen-containing heterocyclic residue and an acid and a photosensitive high molecular compound, having high sensitivity for an extremely small photosensitive group content.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.