Patent · US Expired

Apparatus for supporting crystalline wafers

US4445494A · kind A · utility

8Cited by

10References

8Claims

0Family size

Assignee

Wacker-Chemitronic Gesellschaft fur Elektronik Grundstoffe mbH · DE

Inventors

Bernd Schiele · Goldkronach, DE
Johann Niedermeier · Burghausen, DE

Key dates

Filing date	Sep 23, 1981
Grant date	May 1, 1984
Priority date	—
Expiry date	Sep 23, 2001

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T83/2066
WIPO fieldHandling
WIPO sectorMechanical engineering

Abstract

A process and apparatus for supporting crystalline wafers utilizing the sion effect of flowing gas on the crystalline wafers. An almost point-like support of the crystalline wafer is achieved. Furthermore, the invention relates to a holding tool for carrying out the process, which tool has at the center of the holding face, a point-like projection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.